| 4-Amino-2,2,6,6-Tetramethylpiperidine (TAD) | North Wanxing Chemical Co., Ltd. | 4-Amino-2,2,6,6-Tetramethylpiperidine (TAD) is a hindered-amine light stabilizer intermediate that is a clear or yellowish liquid in appearance. This product is used to provide UV protection and stabilization in printing, paints and coatings. 4-Amino-2,2,...veja mais 4-Amino-2,2,6,6-Tetramethylpiperidine (TAD) is a hindered-amine light stabilizer intermediate that is a clear or yellowish liquid in appearance. This product is used to provide UV protection and stabilization in printing, paints and coatings. 4-Amino-2,2,6,6-Tetramethylpiperidine (TAD) has a boiling point of 188-189°C, gas chromatography content of 98% minimum, and a melting point of 16-18°C. veja menos | |
| Benzophenone | Chongqing Changfeng Chemical Co., Ltd. | Benzophenone is a white to whitish crystal or flake with a light odor. It is a photo-initiator and can be used in UV-curing applications such as inks and clear coatings. | |
| DISPERBYK®-2013 | BYK | O DISPERBYK®-2013 é um umectante sem solventes e aditivo dispersante para sistemas 100% UV e sistemas UV à base de solventes e à base de água para tintas de impressão e revestimentos. Com base na sua polaridade de produto equilibrada e forma de administra...veja mais O DISPERBYK®-2013 é um umectante sem solventes e aditivo dispersante para sistemas 100% UV e sistemas UV à base de solventes e à base de água para tintas de impressão e revestimentos. Com base na sua polaridade de produto equilibrada e forma de administração 100%, o DISPERBYK-2013 alcança uma excelente estabilização, em particular em sistemas 100% UV e especialmente de pigmentos orgânicos e pigmentos negro de fumo. Ao fazê-lo, o produto tem um efeito de redução da viscosidade impressionante e eficaz, reduzindo simultaneamente o comportamento do fluxo tixotrópico. veja menos | |
| EBECRYL® P116 | Allnex | EBECRYL® P 116 is a reactive amine additive used in place of more volatile amine synergists to increase the cure speed of ultraviolet (UV) cured coatings. When EBECRYL® P 116 is used in combination with other photoinitiators an increase in cure speed, esp...veja mais EBECRYL® P 116 is a reactive amine additive used in place of more volatile amine synergists to increase the cure speed of ultraviolet (UV) cured coatings. When EBECRYL® P 116 is used in combination with other photoinitiators an increase in cure speed, especially at the surface, can be realized. It is recommended for use in: overprint varnishes, wood fillers and top coats, and clear coatings on paper and plastics. veja menos | Request Sample |
| GENOCURE* EMK | Rahn AG | GENOCURE* EMK offers formulation options for faster, more effective curing with long wave UV and is well suitable for UV/LED application. It is a photoinitiator for UV-curable inks, coatings, and adhesives. Because it has both Type II and alkyl amine fun...veja mais GENOCURE* EMK offers formulation options for faster, more effective curing with long wave UV and is well suitable for UV/LED application. It is a photoinitiator for UV-curable inks, coatings, and adhesives. Because it has both Type II and alkyl amine functionality, GENOCURE* EMK can be used either with or without supplementary photoinitiators and amine synergists. This product is recommended for offset inks, letterpress inks, screen inks, flexo inks, wood applications, and UV/LED inks and varnishes that can tolerate some yellow color. veja menos | Request Sample |
| GENOMER* 5271 | Rahn AG | GENOMER* 5271 is a moderate viscosity amino acrylate oligomer with fast cure response, excellent flexibility, high gloss, low yellowing and TOLUENE-FREE. It is an acrylated amine resin with particular utility in UV and EB free radical inks, coatings and a...veja mais GENOMER* 5271 is a moderate viscosity amino acrylate oligomer with fast cure response, excellent flexibility, high gloss, low yellowing and TOLUENE-FREE. It is an acrylated amine resin with particular utility in UV and EB free radical inks, coatings and adhesives. GENOMER* 5271 contributes to excellent cure response, toughness, flexibility and adhesion. Unlike conventional amine synergists, GENOMER* 5271 reacts to become part of the product network, leading to lower odor, lower extractables and better overall properties. veja menos | Request Sample |
| Hycure Benzophenone | ChemFine International Co., Ltd. | Hycure Benzophenone is an ultraviolet radiation absorber and intermediate for organic pigments. | |
| Light Stabilizer 123 | North Wanxing Chemical Co., Ltd. | Light Stabilizer 123 is a low basicity hindered amine light stabilizer with a clear, slightly yellow liquid appearance and radical scavenging properties. This product is designed to promote light stabilization and prevent surfaces from blowing-out, peelin...veja mais Light Stabilizer 123 is a low basicity hindered amine light stabilizer with a clear, slightly yellow liquid appearance and radical scavenging properties. This product is designed to promote light stabilization and prevent surfaces from blowing-out, peeling-off, or chalking. Common applications include high solid automotive and industrial coatings, printing ink, and polyurethane lacquers. veja menos | |
| S-381-N5 (Carnauba / Polyethylene Wax Blend) | Shamrock Technologies b.v.b.a. | S-381 N5 é uma mistura de ceras modificada, micronizada para o desempenho de tipo de polipropileno com boa resistência aos raios UV. É um agente de controle de brilho para revestimentos de bobina à base de resina, em pó, madeira e industriais, bem como re...veja mais S-381 N5 é uma mistura de ceras modificada, micronizada para o desempenho de tipo de polipropileno com boa resistência aos raios UV. É um agente de controle de brilho para revestimentos de bobina à base de resina, em pó, madeira e industriais, bem como revestimentos e tintas UV. Com S-381 N5, a lata formuladora controlar o brilho, mantendo as características de dureza superficial. O S-381 N5 pode ser agitado em revestimentos para produzir acabamentos acetinados ou lisos com excelente resistência à deterioração e redução de COF. Um revestimento misturado com S-381 N5 terá uma superfície livre de polimento de pigmento, problemas típicos vividos com sílica. veja menos | |
| TEGO® Twin 4200 | Evonik Operations GmbH, BL Coating Additives | TEGO® Twin 4200 is a universal substrate wetting additive for waterborne wood coatings, industrial coatings and printing inks, which can also be used in solventborne and UV coatings. It provides outstanding wetting and anti-cratering properties. This prod...veja mais TEGO® Twin 4200 is a universal substrate wetting additive for waterborne wood coatings, industrial coatings and printing inks, which can also be used in solventborne and UV coatings. It provides outstanding wetting and anti-cratering properties. This product also offers enhanced reduction of surface tension and high compatibility. veja menos | Request Sample |
