| NexSil™ 12 | Nyacol Nano Technology | NexSil™ 12 is an alkaline dispersion of 12 nm colloidal silica at 30% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatm...view more NexSil™ 12 is an alkaline dispersion of 12 nm colloidal silica at 30% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatment, catalyst binder and more. view less | |
| NexSil™ 125-40 | Nyacol Nano Technology | NexSil™ 125-40 is an alkaline dispersion of 70 - 90 nm colloidal silica at a 40% SiO2 concentration in water. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required and as an ant...view more NexSil™ 125-40 is an alkaline dispersion of 70 - 90 nm colloidal silica at a 40% SiO2 concentration in water. The product can be used in paper, steel and precision polishing applications where large particle size colloidal silica is required and as an anti-slip coating. view less | |
| NexSil™ 125A | Nyacol Nano Technology | NexSil™ 125A is an acidic dispersion of 60 - 80 nm colloidal silica at a 30% SiO2 concentration in water. The product can be used in paper, steel, and precision polishing applications where large-particle size colloidal silica is required. | |
| NexSil™ 125NH4 | Nyacol Nano Technology | NexSil™ 125NH4 is an ammonia-stabilized, aqueous dispersion of 85 nm colloidal silica at a 40% SiO2 concentration in water. This product has applications in surface modifications for cardboard coatings, anti-blocking effects for films and coatings, among ...view more NexSil™ 125NH4 is an ammonia-stabilized, aqueous dispersion of 85 nm colloidal silica at a 40% SiO2 concentration in water. This product has applications in surface modifications for cardboard coatings, anti-blocking effects for films and coatings, among others. view less | |
| NexSil™ 12HS | Nyacol Nano Technology | NexSil™ 12HS is an alkaline dispersion of 12 nm colloidal silica at 40% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binde...view more NexSil™ 12HS is an alkaline dispersion of 12 nm colloidal silica at 40% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required. view less | |
| NexSil™ 20 | Nyacol Nano Technology | NexSil™ 20 is an alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatm...view more NexSil™ 20 is an alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatment, catalyst binder or other applications where a small particle size colloidal silica is required. view less | |
| NexSil™ 20A | Nyacol Nano Technology | NexSil™ 20A is an acidic dispersion of 20 nm colloidal silica at 30% concentration. The product is used as a low sodium colloidal silica binder in investment casting and fibrous refractory applications, to formulate catalyst support structures, and for us...view more NexSil™ 20A is an acidic dispersion of 20 nm colloidal silica at 30% concentration. The product is used as a low sodium colloidal silica binder in investment casting and fibrous refractory applications, to formulate catalyst support structures, and for use with trivalent chromium conversion coatings, among other applications. view less | |
| NexSil™ 20K-30 | Nyacol Nano Technology | NexSil™ is a potassium-stabilized alkaline dispersion of 20nm colloidal silica at 30% SiO2 concentration in water. It can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile...view more NexSil™ is a potassium-stabilized alkaline dispersion of 20nm colloidal silica at 30% SiO2 concentration in water. It can be used in a wide variety of applications such as precision investment casting, precision polishing, metal surface treatment, textile treatment, catalyst binder, or other applications where a small particle-size colloidal silica is required. view less | |
| NexSil™ 20NH4 | Nyacol Nano Technology | NexSil™ 20NH4 is an ammonia-stabilized alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. It can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, cat...view more NexSil™ 20NH4 is an ammonia-stabilized alkaline dispersion of 20 nm colloidal silica at 40% SiO2 concentration in water. It can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications. view less | |
| NexSil™ 35A | Nyacol Nano Technology | NexSil™ 35A is an acidic colloidal silica dispersion of 35nm collidal silica at 30% SIO2 concentration in water. This product is used in binders, cardboard coatings, films, coatings, catalyst production, and precision polishing of semiconductor substrates...view more NexSil™ 35A is an acidic colloidal silica dispersion of 35nm collidal silica at 30% SIO2 concentration in water. This product is used in binders, cardboard coatings, films, coatings, catalyst production, and precision polishing of semiconductor substrates. view less | |
| NexSil™ 6 | Nyacol Nano Technology | NexSil™ 6 is an alkaline dispersion of 6 nm colloidal silica at a 16-18% SiO2 concentration in water. It can be used in paper, steel, and precision polishing applications as well. | |
| NexSil™ 8 | Nyacol Nano Technology | NexSil™ 8 is an alkaline dispersion of 8 nm colloidal silica at 30% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or...view more NexSil™ 8 is an alkaline dispersion of 8 nm colloidal silica at 30% SiO2 concentration in water. The product can be used in a wide variety of applications such as precision investment casting, metal surface treatment, textile treatment, catalyst binder or other applications where a very small particle size colloidal silica is required. view less | |
| NexSil™ 85-40 | Nyacol Nano Technology | NexSil™ 85-40 is an alkaline dispersion of 40-60 nm colloidal silica at a 40% SiO2 concentration in water. The product is used in paper, steel and precision polishing applications as well as specialty wafer polishing applications. | |
| NexSil™ 85A | Nyacol Nano Technology | NexSil™ 85A is an acidic dispersion of 40 - 60 nm colloidal silica at a 30% SiO2 concentration in water. The product can be used in paper, steel, and precision polishing applications. | |
| NexSil™ 85K-40 | Nyacol Nano Technology | NexSil™ 85K-40 is a colloidal silica of 50 nm colloidal silica at a 40% SiO2 concentration in water. This product is used as an abrasive for formulated polishing slurries. | |
| NexSil™ 85NH4 | Nyacol Nano Technology | NexSil™ 85NH4 is an ammonia-stabilized alkaline dispersion of 85 nm colloidal silica at 40% SiO2 concentration in water with low alkali metal levels. It is used in a wide variety of applications such as paper, steel and precision polishing applications. | |
| Nyacol ® DP5540 | Nyacol Nano Technology | Nyacol DP5540, colloidal silica in ethylene glycol, is a dispersion of nano-sized silica particles with a particle size between 100 and 120 nm. It is used in abrasion resistance and anti-blocking properties for PET film. | |
| Nyacol ® DP5480 | Nyacol Nano Technology | Nyacol DP5480, Colloidal Silica in Ethylene Glycol, are Silica particles with a particle size of 50nm colloidal silica at a 30% SiO2 concentration in water. The polymer-grade EG provides abrasion resistance and anti-blocking properties for PET film. | |
| Nyacol® A1550pH7 | Nyacol Nano Technology | Nyacol® A1550pH7 is a water-based dispersion of 30nm particle antimony at 48% Antimony Pentoxide and a pH of 7. It is used in the flame retardant treatments of DMAC solvent systems. | |
| Nyacol® AB40 | Nyacol Nano Technology | Nyacol® AB40 is a nonaqueous dispersion of colloidal antimony peroxide with a specific gravity of 1.67. It is used as a flame retardant synergist in halogen containing polyester and vinyl ester resins. | |
| Nyacol® AL20 | Nyacol Nano Technology | Nyacol® AL20 Colloidal Alumina, a high temperature coating/binder, is a water-based dispersion of particle size 60-90nm at 20% Aluminum content. It is used within high-temperature binders for refractories and ceramics. | |
| Nyacol® APE1540 | Nyacol Nano Technology | Nyacol® APE1540 is a nonaqueous dispersion of colloidal antimony peroxide with a specific gravity of 1.70. It is used as a flame retardant synergist in halogen containing polyester and vinyl ester resins. | |
| Nyacol® APE3040 | Nyacol Nano Technology | Nyacol® APE3040 is a nonaqueous dispersion of colloidal antimony pentoxide formulated for use as a flame retardant synergist in halogen-containing vinyl ester and unsaturated polyester resins. It can replace antimony trioxide in formulas containing bromin...view more Nyacol® APE3040 is a nonaqueous dispersion of colloidal antimony pentoxide formulated for use as a flame retardant synergist in halogen-containing vinyl ester and unsaturated polyester resins. It can replace antimony trioxide in formulas containing bromine or chlorine and can be used in textiles, adhesives, coatings, and water-based systems. view less |
